KINDAI UNIVERSITY


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Hiroshi Muta

Profile

FacultyDepartment of Electrical and Communication Engineering / Graduate School of Industory
PositionProfessor
Degree
Commentator Guidehttps://www.kindai.ac.jp/meikan/1370-muta-hiroshi.html
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Last Updated :2019/07/19

Education and Career

Academic & Professional Experience

  •   2015 04 ,  - 現在, Professor, Kinki University, Human-oriented Engineering

Research Activities

Research Areas

  • Applied physics, Plasma electronics

Research Interests

  • Plasma CVD, Thin-film Silicon Solar Cell, Electromagnetic Waves, ECR Plasma, Numerical Simulation of Electromagnetic Fields

Published Papers

  • Effect of Gas Flow Rate on the High-Rate. Localized Jet-Deposition of Silicon in SiH4/H2 PE-CVD, S. Nishida, H. Muta, S. Kuribayashi, Journal of Chemical Engineering of Japan, 47, 478 - 482, 2014 , Refereed
  • Estimation of Negative Ions in VHF SiH4/H2 Plasma, T. Yamane, S. Nakano, S. Nakao, Y. Takeuchi, R. Ichiki, H. Muta, K. Uchino, Y. Kawai, Japanese Journal of Applied Physics, 53, 116101-1 - 116101-4, 2014 , Refereed
  • Effect of VHF Excitation Frequency on Localized Deposition of Silicon in Non Equilibrium-plasma-enhanced CVD by an Under Expanded Supersonic Jet, S. Kuribayashi, Y. Tsunekawa, S. Akahori, D. Ando, J. Nakamura, S. Nishida, H. Muta, Y. Takeuchi, Y. Yamauchi, H. Takatsuka, Surface & Coatings Technology, 225, 75 - 78, 2013 , Refereed
  • VHF SiH4/H2 Plasma Characteristics With Negative Ions, T. Yamane, S. Nakao, Y. Takeuchi, Y. Yamauchi, H. Takatsuka, H. Muta, K. Uchino, Y. Kawai, Surface & Coatings Technology, 228, S433 - S436, 2013 , Refereed
  • Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe, T. Yamane, S. Nakao, Y. Takeuchi, H. Muta, R. Ichiki, K. Uchino, Y. Kawai, Contributions to Plasma Physics, 53, 588 - 591, 2013 , Refereed