KINDAI UNIVERSITY


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Nobuto Oka

Profile

FacultyDepartment of Biological and Environmental Chemistry / Graduate School of Industory
PositionAssociate Professor
Degree
Commentator Guidehttps://www.kindai.ac.jp/meikan/1492-oka-nobuto.html
URL
Mail
Last Updated :2019/07/19

Education and Career

Education

  •  - 2006 09 , University of Tokyo

Academic & Professional Experience

  •   2016 04 ,  - 現在, Associate Professor, Kindai University
  •   2013 04 ,  - 2016 03 , Associate Professor (Specially Appointed for Research), Tohoku University
  •   2012 04 ,  - 2013 03 , Associate Professor, The Graduate School of Project Design
  •   2008 04 ,  - 2012 03 , Aoyama Gakuin University
  •   2006 10 ,  - 2008 03 , University of Tokyo

Research Activities

Research Areas

  • Mechanical engineering, Thermal engineering
  • Informatics, Fundamental theory of informatics
  • Applied physics, Thin film/Surface and interfacial physical properties
  • Material engineering, Inorganic materials/Physical properties
  • Applied Chemistry, Functional materials chemistry
  • Informatics, Media informatics/Database

Published Papers

  • Effect of Substitutional Doping of Tin in Highly Conductive Barium Iron Vanadate Glass, Y. Fujita, H. Miyamoto, S. Kubuki, S. Masuda, T. Nishida, N. Oka, Physica Status Solidi A (in press), 2019 , Refereed
  • Electronic States of Quinones for Organic Energy Devices: The Effect of Molecular Structure on Electrochemical Characteristics, N. Nagamura, R. Taniki, Y. Kitada, A. Masuda, H. Kobayashi, N. Oka, I. HONMA, ACS Applied Energy Materials, 1, 3084 - 3092, Jul. 2018 , Refereed
  • Correlation between the carbon structures and their tolerance to carbon corrosion as catalyst supports for polymer electrolyte fuel cells, T. Tamaki, H. Wanga, N. Oka, I. Honma, S.-H. Yoond, T. Yamaguchi, International Journal of Hydrogen Energy, 43, 6406 - 6412, Mar. 2018 , Refereed
  • Structural Relaxation and Electrical Conductivity of Molybdovanadate Glass, T. Nishida, I. Furumoto, Y. Fujita, S. Kubuki, N. Oka, Journal of Materials Science: Materials in Electronics, 29, 2654 - 2659, Feb. 2018 , Refereed
  • Capacity improvement of the carbon-based electrochemical capacitor by zigzag-edge introduced graphene, N. Tamura, T. Tomai, N. Oka, I. Honma, Applied Surface Science, 428, 986 - 989, Jan. 2018 , Refereed
  • Fabrication of Cu2ZnSnS4 thin films using a Cu-Zn-Sn-O amorphous precursor and supercritical fluid sulfurization, Y. Nakayasu, T. Tomai, N. Oka, K. Shojiki, S. Kuboya, R. Katayama, L. Sang, M. Sumiya, I. Honma, Thin Solid Films, 638, 244 - 250, Sep. 2017 , Refereed
  • Water purification using porous ceramics prepared by recycling volcanic ash and waste glass, T. Ando, Y. Fujita, M. Kakinaga, N. Oka, T. Nishida, Applied Water Science, 7, 4109 - 4115, May 2017 , Refereed
  • Highly conductive barium iron vanadate glass containing different metal oxides, T. Nishida, Y. Izutsu, M. Fujimura, K. Osouda, Y. Otsuka, S. Kubuki, N. Oka, Pure and Applied Chemistry, 89, 419 - 428, Mar. 2017 , Refereed
  • Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering, N. Oka, A. Murata, S. Nakamura, J. Jia, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, APL Materials, 3, 104407-1 - 104407-6, 2015 , Refereed
  • Controllable bandgap of Cu2ZnSn(S,Se)4 thin films via simultaneous supercritical fluid chalcogenization, Y. Nakayasu, T. Tomai, N. Oka, I. Honma, Appl. Phys. Express, 8, 021201-1 - 021201-4, 2015 , Refereed
  • Thermophysical Properties of SnO2-based Transparent Conductive Films: Effect of Dopant Species and Structures, Compared with In2O3-, ZnO-, TiO2-based Films, N. Oka, S. Yamada, T. Yagi, N. Taketoshi, J. Jia, Y. Shigesato, Journal of Materials Research, 29(15), 1579 - 1584, Aug. 2014 , Refereed
  • Transparent conductive Nb-doped TiO2 films deposited by reactive dc sputtering using Ti-Nb alloy target, precisely controlled the transition region using impedance feedback system, N. Oka, Y. Sanno, J. Jia, S. Nakamura, Y. Shigesato, Appl. Surf. Sci., 301, 551 - 556, Apr. 2014 , Refereed
  • Origin of carrier scattering in polycrystalline Al -doped ZnO films, J. Jia, N. Oka, M. Kusayanagi, S. Nakatomi, Y. Shigesato, Appl. Phys. Express, 7, 105802-1 - 105802-4, 2014 , Refereed
  • Al-doped ZnO films deposited on a slightly reduced buffer layer by reactive dc unbalanced magnetron sputtering, M. Kusayanagi, A. Uchida, N. Oka, J. Jia, S. Nakamura, Y. Shigesato, Thin Solid Films Films, 555, 93 - 99, 2014 , Refereed
  • Study on reactive sputtering to deposit transparent conductive amorphous In2O3-ZnO films using an In-Zn alloy target, N. Tsukamoto, S. Sensui, J. Jia, N. Oka, Y. Shigesato, Thin Solid Films, 559, 49 - 52, 2014 , Refereed
  • Transparent conductive Al and Ga doped ZnO films deposited using off-axis sputtering, J. Jia, A. Yoshimura, Y. Kagoya, N. Oka, Y. Shigesato, Thin Solid Films, 559, 69 - 77, 2014 , Refereed
  • Early stages of Sn-doped In2O3 film growth on amorphous SiO2 surfaces observed by atomic force microscopy and transmission electron microscopy, Y. Sato, N. Oka, S. Nakamura, Y. Shigesato, Jpn. J. Appl. Phys., 52, 128007-1 - 128007-3, 2013 , Refereed
  • Reactive Gas-Flow-Sputter Deposition of Amorphous WO3 Films for Electrochromic devices, N. Oka, M. Watanabe, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, Thin Solid Films, 532, 1 - 6, 2013 , Refereed
  • Thermal Conductivity of Amorphous Indium–Gallium–Zinc Oxide Thin Films, T. Yoshikawa, T. Yagi, N. Oka, J. Jia, Y. Yamashita, K. Hattori, Y. Seino, N. Taketoshi, T. Baba, Y. Shigesato, Appl. Phys. Express, 6, 021101-1 - 021101-3, 2013 , Refereed
  • Thermal Boundary Resistance of W/Al2O3 Interface in W/Al2O3/W Three-layered Thin Film and Its Dependence on Morphology, S. Kawasaki, Y. Yamashita, N. Oka, T. Yagi, J. Jia, N. Taketoshi, T. Baba, Y. Shigesato, Jpn. J. Appl. Phys., 52(6), 065802-1 - 065802-5, 2013 , Refereed
  • Direct observation of the band gap shrinkage in amorphous In2O3-ZnO thin films, J. Jia, N. Oka, Y. Shigesato, Journal of Applied Physics, 113, 163702-1 - 163702-7, 2013 , Refereed
  • Visible–light active photocatalytic WO3 films loaded with Pt nanoparticles deposited by sputtering, A. Murata, N. Oka, S. Nakamura, Y. Shigesato, J. Nanosci. Nanotechnol., 12(6), 5082 - 5086, Jun. 2012 , Refereed
  • Annealing Effects on Ta Doped SnO2 Films, J. Jia, Y. Muto, N. Oka, Y. Shigesato, Mater. Res. Soc. Symp. Proc., 1454, 245 - 251, 2012 , Refereed
  • Experimental Observation on the Fermi level Shift in Polycrystalline Al-doped ZnO Films, J. Jia, A. Takasaki, N. Oka, Y. Shigesato, Journal of Applied Physics, 112, 013718-1 - 013718-7, 2012 , Refereed
  • Electronic State of Amorphous Indium Gallium Zinc Oxide Films Deposited by DC Magnetron Sputtering with Water Vapor Introduction, N. Oka, T. Aoi, R. Hayashi, H. Kumomi, Y. Shigesato, Applied Physics Express, 5, 075802-1 - 075802-3, 2012 , Refereed
  • Visible light-induced photocatalytic properties of WO3 films deposited by DC reactive magnetron sputtering, M. Imai, M. Kikuchi, N. Oka, Y. Shigesato, J. Vac. Sci. Technol. A, 30, 031503-1 - 031503-5, 2012 , Refereed
  • In-situ analyses on the reactive sputtering process to deposit Al doped ZnO films using an Al-Zn alloy target, N. Tsukamoto, N. Oka, Y. Shigesato, Thin Solid Films, 520, 3751 - 3754, 2012 , Refereed
  • High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target, Y. Muto, S. Nakatomi, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, Thin Solid Films, 520, 3746 - 3750, 2012 , Refereed
  • High-rate deposition of high-quality Sn-doped In2O3 films by reactive magnetron sputtering using alloy targets, N. Oka, Y. Kawase, Y. Shigesato, Thin Solid Films, 520, 4101 - 4105, 2012 , Refereed
  • Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor, S.V. Green, M. Watanabe, N. Oka, G.A. Niklasson, C.G. Granqvist, Y. Shigesato, Thin Solid Films, 520, 3839 - 3842, 2012 , Refereed
  • Thermophysical properties of transparent conductive Nb-doped TiO2 films, C. Tasaki, N. Oka, T. Yagi, N. Taketoshi, T. Baba, T. Kamiyama, S. Nakamura, Y. Shigesato, Jpn. J. Appl. Phys., 51, 035802-1 - 035802-5, 2012 , Refereed
  • Thermophysical and electrical properties of Al-doped ZnO films, N. Oka, K. Kimura, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, Journal of Applied Physics, 111, 093701-1 - 093701-5, 2012 , Refereed
  • Photocatalytic Activity of WO3 Films Crystallized by Postannealing in Air, J. Takashima, N. Oka, Y. Shigesato, Jpn. J. Appl. Phys., 51, 055501-1 - 055501-5, 2012 , Refereed
  • Thermal Conductivity of Amorphous Indium Zinc Oxide Thin Films, R. Endoh, T. Hirano, M. Takeda, M. Oishi, N. Oka, Y. Shigesato, Mater. Res. Soc. Symp. Proc. , 1315, mm11-05, 2011 , Refereed
  • High Rate Reactive Sputter Deposition of TiO2 Films for Photocatalyst and Dye-Sensitized Solar Cells, Y. Sato, T. Hashimoto, A. Miyamura, S. Ohno, N. Oka, K. Suzuki, D. Glöß, P. Frach, Y. Shigesato, Jpn. J. Appl. Phys., 50, 045802-1 - 045802-10, 2011 , Refereed
  • Oxidation Resistance of Ti-Si-N and Ti-Al-Si-N Films Deposited by Reactive Sputtering Using Alloy Targets, K. Takahashi, N. Oka, M. Yamaguchi, Y. Seino, K. Hattori, S. Nakamura, Y. Sato, Y. Shigesato, Jpn. J. Appl. Phys., 50, 075802-1 - 075802-5, 2011 , Refereed
  • In-situ analysis of positive and negative energetic ions generated during Sn-doped In2O3 deposition by reactive sputtering, N. Tsukamoto, T. Tazawa, N. Oka, M. Saito, Y. Shigesato, Thin Solid Films, 520(4), 1182 - 1185, 2011 , Refereed
  • High-rate deposition of Sb-doped SnO2 films by reactive sputtering using the impedance control method, Y. Muto, N. Oka, N. Tsukamoto, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, Thin Solid Films, 520(4), 1178 - 1181, 2011 , Refereed
  • Effect of Nb Concentration on Thermal Diffusivity of Nb-Doped TiO2 Films, C. Tasaki, N. Oka, T. Yagi, N. Taketoshi, T. Baba, T. Kamiyama, Y. Shigesato, Netsu Bussei, 25(3), 117 - 120, 2011 , Refereed
  • Thermal Boundary Resistance between N,N'-Bis(1-naphthyl)-N,N'-diphenylbenzidine and Aluminum Films, N. Oka, K. Kato, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, Jpn. J. Appl. Phys., 50, 11RB02-1 - 11RB02-3, 2011 , Refereed
  • Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering, T. Yagi, N. Oka, T. Okabe, N. Taketoshi, T. Baba, Y. Shigesato, Jpn. J. Appl. Phys., 50, 11RB01-1 - 11RB01-5, 2011 , Refereed
  • Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar pulsing and plasma emission control systems, K. Hirohata, Y. Nishi, N. Tsukamoto, N. Oka, Y. Sato, I. Yamamoto, Y. Shigesato, Thin Solid Films, 518, 2980 - 2983, 2010 , Refereed
  • DC Sputter deposition of amorphous indium-gallium-zinc-oxide (a-IGZO) films with H2O introduction, T. Aoi, N. Oka, Y. Sato, R. Hayashi, H. Kumomi, Y. Shigesato, Thin Solid Films, 518, 3004 - 3007, 2010 , Refereed
  • Thermophysical properties of aluminum oxide and molybdenum layered films, N. Oka, R. Arisawa, A. Miyamura, Y. Sato, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, Thin Solid Films, 518, 3119 - 3121, 2010 , Refereed
  • In-situ analyses on reactive sputtering processes to deposit photocatalytic TiO2 films, N. Ito, S. Miyatake, N. Tsukamoto, N. Oka, Y. Sato, Y. Shigesato, Jpn. J. Appl. Phys., 49, 041105-1 - 041105-5, 2010 , Refereed
  • Carrier density dependence of optical band gap and work function for Sn-doped In2O3 films, Y. Sato, T. Ashida, N. Oka, Y. Shigesato, Appl. Phys. Express, 3, 061101-1 - 061101-3, 2010 , Refereed
  • Effects of Energetic Ion Bombardment on Structural and Electrical Properties of Al-Doped ZnO Films Deposited by RF-Superimposed DC Magnetron Sputtering, N. Ito, N. Oka, Y. Sato, Y. Shigesato, Jpn. J. Appl. Phys., 49, 071103-1 - 071103-5, 2010 , Refereed
  • In situ analyses on negative ions in the sputtering process to deposit Al-doped ZnO films, N. Tsukamoto, D. Watanabe, M. Saito, Y. Sato, N. Oka, Y. Shigesato, J. Vac. Sci. Technol. A, 28(4), 846, 2010 , Refereed
  • Electrical and Optical properties of Nb-doped TiO2 films deposited by dc magnetron sputtering using slightly reduced Nb-doped TiO2-x ceramic targets, Y. Sato, Y. Sanno, C. Tasaki, N. Oka, T. Kamiyama,Y. Shigesato, J. Vac. Sci. Technol. A, 28(4), 851, 2010 , Refereed
  • Study on MoO3-x films deposited by reactive sputtering for organic light‐emitting diodes, N. Oka, H. Watanabe, Y. Sato, N. Ito, H. Tsuji, Y. Shigesato, J. Vac. Sci. Technol. A, 28(4), 886, 2010 , Refereed
  • Spatial distribution of electrical properties for Al-doped ZnO films deposited by dc magnetron sputtering using various inert gases, Y. Sato, K. Ishihara, N. Oka, Y. Shigesato, J. Vac. Sci. Technol. A, 28(4), 895, 2010 , Refereed
  • High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system, Y. Nishi, K. Hirohata, N. Tsukamoto, Y. Sato, N. Oka, Y. Shigesato, J. Vac. Sci. Technol. A, 28(4), 890, 2010 , Refereed
  • High-Performance and High-CRI OLEDs for Lighting and Their Fabrication Processes, T. Komoda, T. Iwakuma, M. Yamamoto, N. Oka, Y. Shigesato, Advances in Science and Technology, 75, 65 - 73, 2010 , Refereed
  • Thermal Diffusivities of Tris(8-hydroxyquinoline)aluminum and N,N'-di(1-naphthyl)-N,N'-diphenylbenzidine Thin Films with Sub-Hundred Nanometer Thicknesses, N. Oka, K. Kato, T. Yagi, N. Taketoshi, T. Baba, N. Ito, Y. Shigesato, Jpn. J. Appl. Phys., 49, 121602-1 - 121602-4, 2010 , Refereed
  • Nb doped TiO2 films with low resistivity deposited by dc magnetron sputtering using a TiO2-x target for transparent conductive electrodes, Y. Sato, Y. Sanno, N. Oka, T. Kamiyama, Y. Shigesato, Mater. Res. Soc. Symp. Proc., 1109E, B03-26, 2009 , Refereed
  • Properties of IGZO films deposited by Dc Magnetron sputtering with H2O introduction, T. Aoi, N. Oka, Y. Sato, R. Hayashi, H. Kumomi, Y. Shigesato, Mater. Res. Soc. Symp. Proc. , 1109E , B03-09, 2009 , Refereed
  • High rate deposition of Al-doped ZnO (AZO) by reactive sputtering (1); Unipolar pulsing with plasma emission control, K. Hirohata, Y. Nishi, N. Oka, Y. Sato, I. Yamamoto, Y. Shigesato, Mater. Res. Soc. Symp. Proc., 1109E , B03-07, 2009 , Refereed
  • Thermal transport properties of polycrystalline tin-doped indium oxide films, T. Ashida, A. Miyamura, N. Oka, Y. Sato, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, Journal of Applied Physics, 105(7), 073709, 2009 , Refereed
  • Sputter deposition of Al-doped ZnO films with various incident angles, Y. Sato, K. Yanagisawa, N. Oka, S. Nakamura, Y. Shigesato, J. Vac. Sci. Technol. A, 27(5), 1166, 2009 , Refereed
  • Transmission Electron Microscopy Observation on the Early Stages of Sn-Doped In2O3 Film Growth Deposited on Amorphous Carbon Films by DC Magnetron Sputtering, Y. Sato, S. Nakamura, N. Oka, Y. Shigesato, Appl. Phys. Express, 2, 095501-1 - 095501-3, 2009 , Refereed
  • Study on inverse spinel zinc stannate, Zn2SnO4, as transparent conductive films deposited by rf magnetron sputtering, Y. Sato, J. Kiyohara, A. Hasegawa, T. Hattori, M. Ishida, N. Hamada, N. Oka, Yuzo Shigesato, Thin Solid Films, 518(4), 1304 - 1308, 2009 , Refereed
  • Development of Information Platform for Data Exchange between Heterogeneous Material Data Resources, T. Ashino, N. Oka, Proc. of Materials Science and Technology, 3, 1851 - 1861, Sep. 2007 , Refereed
  • Cyber Connection for Cross-border Collaboration, N. Oka, S. Iwata, Journal of Japan Society of Information and Knowledge, 17(1), 32 - 40, 2007 , Refereed
  • Material database syndication with RSS, T. Ashino, N. Oka, Data Science Journal, 6, S847 - S852, 2007 , Refereed
  • Fractal Characteristics of Colloid Deposition, J. Jia, S. Iwata, Y. Seida, Y. Kaneta, N. Oka, Z. Zhang, Data Science Journal, 6, S206 - S219, 2007 , Refereed

Conference Activities & Talks

  • Local Structure of Conductive Vanadate Glass Applied to the Oxygen Electrode for Rechargeable Metal-Air Battery, N. Oka, H. Miyamoto, Y. Fujita, S. Masuda, M. Yuasa and T. Nishida, 4th Mediterranean Conference on the Applications of the Mössbauer Effect (MECAME2018),   2018 05 , 招待有り
  • Thermal transport in transparent conductive oxide films, N. Oka, Y. Shigesato, CIMTEC 2018 - 14th International Ceramics Congress & 8th Forum on New Materials,   2018 06 , 招待有り
  • Study on visible-light active photocatalytic WO3 films loaded with Ptnanoparticles,   2018 12
  • Adsorption and Recovery Technology for Various Metal Ions in Aqueous Solution using PAMPS Hydrogel,   2018 12
  • Air-Electrode Catalyst using Carbon Nanoparticles Synthesized by Solution Plasma Method,   2018 12
  • Electrical Properties of Conductive Vanadate Glass and its Application to the Air-Electrode Catalyst for Rechargeable Metal-Air Battery,   2018 12
  • Development of Air-Electrode Catalyst using Vanadate Glass for Rechargeable Metal-Air Battery,   2018 12
  • Local Structure and Electrocatalytic Properties of Conductive Vanadate Glass Applied to Metal-Air Rechargeable Battery, N. Oka, H. Miyamoto, Y. Fujita, S. Masuda, M. Yuasa, T. Nishida, 9th TOYOTA RIKEN International Workshop on New Developments and Prospects for the Future of Mössbauer Spectroscopy (IWMS2018),   2018 11
  • XANES analysis of quinones for organic energy devices, N. Nagamura, R. Taniki, Y. Kitada, A. Masuda, H. Kobayashi, N. Oka, I. Honma, 14th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-14),   2018 10
  • Removal of Various Metal Ions in Aqueous Solution using Poly(2-acrylamido-2-methyl-1-propanesulfonic acid) Hydrogel, S. Masuda, R. Sugimoto, T. Nishida, N. Oka , E-MRS & MRS-J Bilateral Symposium,   2018 10
  • Highly Conductive Vanadate Glass Containing Tin Oxide or Indium Oxides, Y. Fujita, S. Masuda, N. Yamaguchi, T. Izumi, S. Shiba, S. Kubuki, T. Nishida, N. Oka, E-MRS & MRS-J Bilateral Symposium,   2018 10
  • Development of Bifunctional Air-Electrode for Metal-Air Battery using Conductive Vanadate Glass, H. Miyamoto, M. Yuasa, T. Nishida, N. Oka, E-MRS & MRS-J Bilateral Symposium,   2018 10
  • M?ssbauer Study on the Substitution of Tin Oxide for Iron Oxide in Conductive Barium Iron Vanadate Glass, Y. Fujita, H. Miyamoto, T. Izumi, S. Masuda, S. Kubuki, T. Nishida, N. Oka, CIMTEC 2018 - 14th International Ceramics Congress & 8th Forum on New Materials,   2018 06
  • Substitution Effect in Highly Conductive Barium Iron Vanadate Glass, T. Nishida, Y. Fujita, S. Kubuki and N. Oka, 4th Mediterranean Conference on the Applications of the M?ssbauer Effect (MECAME2018),   2018 05
  • Local Structural Analysis of Conductive Vanadate Glass Containing Tin or Indium by Means of M?ssbauer Spectroscopy (Young Scientist Best Paper Award), N. Yamaguchi, T. Izumi, Y. Fujita, S. Masuda, H. Miyamoto, S. Kubuki, T. Nishida and N. Oka, 4th Mediterranean Conference on the Applications of the M?ssbauerEffect (MECAME2018),   2018 05
  • Substitutional Effect of Metal Oxides on Conductive Vanadate Glass and its Application to Metal-Air Rechargeable Battery, N. Oka, H. Miyamoto, Y. Fujita, S. Masuda, M. Yuasa, S. Kubuki and T. Nishida, 第19回メスバウアー分光研究会シンポジウム,   2018 03
  • Review on Thermophysical Properties of Transparent Conductive Oxide Films, N. Oka, Y. Shigesato, 第27回日本MRS年次大会,   2017 12 , 招待有り
  • Thermophysical Properties of Transparent Conductive Oxide Thin Films, N. Oka, Y. Shigesato, The 15th International Conference on Advanced Materials (IUMRS-ICAM 2017),   2017 08 , 招待有り
  • Local Structural Analysis of Conductive Vanadate Glass by Means of RT-Mossbauer Spectroscopy and Substitutional Effect of Tin Oxide for Iron Oxide, 藤田裕樹, 宮本孟, 伊豆見知佳, 増田彩花, 久富木志郎, 西田哲明, 岡伸人, 第27回日本MRS年次大会,   2017 12
  • Vanadate Glass Applied to Metal-Air Battery as Air Electrode Catalyst, 宮本孟, 藤田裕樹, 増田彩花, 湯浅雅賀, 西田哲明, 岡伸人, 第27回日本MRS年次大会,   2017 12
  • Electrochromic WO3 Films with controlled high-rate deposition by Hollow Cathode Gas Flow Sputtering, N. Oka, M. Watanabe, J. Jia, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 232nd ECS MEETING,   2017 10
  • Visible-light active thin-film WO3 photocatalyst crystallized by post-annealing in air , N. Oka, J. Takashima, A. Murata, J. Jia, Y. Shigesato, 232nd ECS MEETING,   2017 10
  • Local Structure of Highly Conductive Vanadate Glass containing Tin Oxide Studied by RT-M?ssbauer spectrum, Y. Fujita, T. Izumi, S. Kubuki, T. Nishida, N. Oka, 232nd ECS MEETING,   2017 10
  • Electrocatalytic Properties of Vanadate Glass for Metal-Air rechargeable Battery, H. Miyamoto, M. Yuasa, T. Nishida, N. Oka, 232nd ECS MEETING,   2017 10
  • Reactive sputter deposition of Nb-doped TiO2 films using Ni-Ti alloy target with impedance control systems, N. Oka, Y. Sanno, J. Jia, Y. Shigesato, The 15th International Conference on Advanced Materials (IUMRS-ICAM2017),   2017 08
  • Substitutional Effect of Tin on Highly Conductive Barium Iron Vanadate Glass: Structure and Electrical Conductivity, Y. Fujita, T. Izumi, S. Kubuki, T. Nishida, N. Oka, The 15th International Conference on Advanced Materials (IUMRS-ICAM2017),   2017 08
  • Vanadate Glass applied to Bifunctional Oxygen Electrode for Metal-Air rechargeable Battery, H. Miyamoto, M. Yuasa, T. Nishida, N. Oka, The 15th International Conference on Advanced Materials (IUMRS-ICAM2017),   2017 08
  • M?ssbauer Spectra of Highly Conductive Vanadate Glass Containing Tin Oxide, Y. Fujita, T. Izumi, S. Kubuki, T. Nishida, N. Oka, 10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-10),   2017 07
  • Vanadate Glass applied to Oxygen Electrode in Metal-Air Rechargeable Battery, H. Miyamoto, M. Yuasa, T. Nishida, N. Oka, 10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-10),   2017 07
  • Local Structure of Highly Conductive Barium Iron Vanadate Glass Containing Different Metal Oxides, Y. Fujita, Y. Izutsu, M. Fujimura, K. Osouda, S. Kubuki, N. Oka, T. Nishida, Joint International Symposium on "Regional Revitalization and Innovation for Social Contribution" and "e-ASIA Functional Materials and Biomass Utilization 2016" (JISRI. e-ASIA 2016),   2016 12
  • Thin-Film WO3 Photocatalyst with Visible Light Activity; (2) Deposition by the Hollow Cathode Gas Flow Sputtering, N. Oka, A. Murata, Y. Iwabuchi, H. Kotsubo, J. Jia, S. Nakamura, Y. Shigesato, 2016 MRS Fall Meeting & Exhibit,   2016 11
  • Thin-Film WO3 Photocatalyst with Visible Light Activity?(1) Deposition by the Conventional Reactive Sputtering, A. Murata, N. Oka, J. Jia, S. Nakamura, Y. Shigesato, 2016 MRS Fall Meeting & Exhibit,   2016 11
  • 57Fe-M?ssbauer study of sodium vanadate glass with high electrical conductivity, S. Kubuki, S. Shiba, K. Osouda, K. Akiyama, E. Kuzmann, Z. Homonnay, N. Oka, T. Nishida, XV Latin American Conference on the Applications of the M?ssbauer Effect (LACAME 2016),   2016 11
  • Highly conductive barium iron vanadate glass containing different metal oxides, T. Nishida, Y. Izutsu, M. Fujimura, K. Osouda, Y. Otsuka, S. Kubuki, N. Oka, The Solid State Chemistry Conference (SSC 2016),   2016 09 , 招待有り
  • Analyses of new chalcogenization process using supercritical ethanol for low-cost fabrication of metal-chalcogenide materials, Y. Nakayasu, T. Tomai, N. Oka, I. Honma, trimurti19765th International Solvothermal And Hydrothermal Association Conference 2016,   2016 01
  • Heat Transfer in Transparent Conductive Oxide Films with a Sub-Micron Thickness, N. Oka, Y. Shigesato, The Symposium on Phase Change Oriented Science 2015 (PCOS2015),   2015 11 27 , 招待有り
  • Rapid Mass Production of Graphene by Supercritical Fluid, N. Oka, T. Tomai, I. Honma, trimurti1976The 12th International Conference on Flow Dynamics (ICFD2015),   2015 10 27 , 招待有り
  • Fabrication of Cu2ZnSn(S,Se)4 thin films via simultaneous supercritical fluid chalcogenization, Y. Nakayasu, T. Tomai, N. Oka, M. Sumiya, I. Honma, International Conference on Frontiers in Materials Processing, Applications, Research & Technology (FiMPART'15),   2015 06
  • High-rate reactive sputter deposition for Transparent Conductive Oxide Films, Nobuto Oka, The 1st E-MRS/MRS-J Bilateral Symposia,   2014 12 12 , 招待有り
  • Review on thermophysical properties of various TCO thin films; ITO, IZO, AZO, ATO, TTO and NTO films, Nobuto Oka, 10th International Conference on Glass and Plastics (ICCG10),   2014 06 26 , 招待有り
  • Rapid synthesis of high-yielding graphene by supercritical fluid exfoliation, N. Oka, T. Tomai, I. Honma, 10th International Conference on Glass and Plastics(ICCG10),   2014 06
  • Thermal transport properties of ITO, IZO, AZO, ATO, TTO and NTO films, N. Oka, J. Jia, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato, 2013 JSAP-MRS Joint Symposia,   2013 09 17 , 招待有り
  • Thermophysical Properties of Various TCO Films: ITO, IZO, AZO, and NTO films, J. Jia, N. Oka, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato, 10th Asian Termophysical Properties Conference (ATPC2013),   2013 09
  • Carrier transport in polycrystalline Al doped ZnO films, J. Jia, M. Kusayanagi, N. Oka, S. Nakatomi, Y. Shigesato, 2013-JSAP-MRS Joint Symposia,   2013 09
  • Fabrication and characterization of Al doped ZnO films using reactive magnetron sputtering, J, Jia, M. Kusayanagi, N. Oka, Y. Shigesato, 12th International Symposium on Sputtering & Plasma processes (ISSP2013),   2013 07
  • In-situ analyses on the reactive sputtering process to deposit amorphous In2O3-ZnO films using an In-Zn alloy target, N. Tsukamoto, S. Sensui, J. Jia, N. Oka, Y. Shigesato, 8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8),   2013 05
  • Atomic forced microscopy and transmission electron microscopy observations on the early stages of Sn-doped In2O3 film growth deposited on a-SiO2 Surface by dc magnetron sputtering, Y. Sato, N. Oka, S. Nakamura, Y. Shigesato, 8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8),   2013 05
  • Nb-doped TiO2 films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target with impedence control systems, N. Oka, Y. Sanno, N. Tsukamoto, J. Jia, Y. Shigesato, 8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8),   2013 05
  • Transparent Conductive Al or Ga doped ZnO films deposited by off-axis sputtering, J. Jia, A. Yoshimura, Y. Kagoya, N. Oka, and Y. Shigesato, 8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8),   2013 05
  • Thermophysical properties of amorphous indium-gallium-zinc-oxide thin films, T. Yoshikawa, N. Oka, J. Jia, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, K. Hattori, Y. Seino, Y. Shigesato , 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • high quality Al or Ga doped ZnO films deposited by off-axis sputtering, A. Yoshimura, Y. Kagoya, N. Oka, J. Jia, Y. Shigesato , 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • Amorphous Indium-Tin-Zinc-Oxide (a-ITZO) films deposited by DC sputtering with O2, H2O, N2 introduction, Y. Torigoshi, T. Matoba, N. Oka, J. Jia, E. Kawashima, M. Nishimura, M. Kasami, K. Yano, Y. Shigesato , 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • Nb-doped TiO2 films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target with impedance control systems, N. Oka, Y. Sanno, N. Tsukamoto, J. Junjun, Y. Shigesato, 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • Al-doped ZnO films deposited by reactive sputtering using slightly reduced buffer layer, M. Kusayanagi, A. Uchida, N. Oka, J. Jia, Y. Shigesato, 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • Optical properties of polycrystalline or amorphous In2O3-based transparent conductive films, R. Sato, N. Oka, J. jia, F. Utsuno, A. Kaijo, Y. Shigesato, 4th International Symposium on Transparent Conductive Materials(TCM 2012),   2012 10
  • Fermi level shift of polycrystalline ITO and amorphous IZO thin films, J. Jia, A. Takasaki, N. Oka, Y. Shigesato, 20th Annual International Conference on Composites or Nano Engineering(ICCE) ,   2012 07
  • Nb-doped TiO2 films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target, N. Oka, Y. Sanno, N. Tsukamoto, Y. Shigesato, 9th International Conference on Coatings on Glass and Plastics(ICCG-9),   2012 06
  • High performance electrochromic WO3 films deposited by hollow cathode gas flow sputtering, M. Watanabe, N. Oka, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 9th International Conference on Coatings on Glass and Plastics(ICCG-9),   2012 06
  • How work function depends on carrier density and optical band gap various TCO films, A. Takasaki, J. Jia, N. Oka, Y. Shigesato, 9th International Conference on Coatings on Glass and Plastics(ICCG-9),   2012 06
  • Visible-light active photocatalytic Pt/WO3 films deposited by hollow cathode gas flow sputtering, A. Murata, N. Oka, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 9th International Conference on Coatings on Glass and Plastics(ICCG-9),   2012 06
  • Electrochromic WO3 Films Deposited by Hollow Cathode Gas Flow Sputtering with Very High Deposition Rate, M. Watanabe, N. Oka, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 9th International Conference on Coatings on Glass and Plastics(ICCG-9),   2012 06
  • Sputter Deposition of WO3 Films as Visible Light-active Photocatalyst, N. Oka, M. Kikuchi, M. Imai, J. Jia, Y. Shigesato, 2012 MRS Spring Meeting,   2012 04
  • Nb-doped TiO2 Films with Low Resistivity Deposited by Reactive dc Magnetron Sputtering with Impedance Control Systems, N. Oka, Y. Sanno, N. Tsukamoto, J. Jia, Y. Shigesato, 2012 MRS Spring Meeting ,   2012 04
  • Carrier Transport Properties of Sb- and Ta-doped SnO2 (ATO and TTO) Films, J. Jia, N. Oka, Y. Muto, Y. Shigesato, 2012 MRS Spring Meeting,   2012 04
  • Comparative Study on Electrical and Optical Properties between Polycrystalline ITO, AZO and Amorphous IZO Films, J. Jia, N. Oka, A. Takasaki, Y. Shigesato, 2012 MRS Spring Meeting,   2012 04
  • Experimental Observation of Fermi Level Shift in Aluminum Doped ZnO Films, J. Jia, N. Oka, A. Takasaki, Y. Shigesato, 2012 MRS Spring Meeting,   2012 04
  • Study on Polycrystalline WO3 Films as Visible Light-active Photocatalyst, J. Takashima, A. Murata, N. Oka, Y. Shigesato, The 21st MRS-Japan Academic Symposium ,   2011 12
  • Effects of Mesh on The Reactive Sputtering Process to Deposit TiNX and TiOX Films Using Ti Target, M. Ozawa, N. Tsukamoto, N. Oka, Y. Shigesato, The 21st MRS-Japan Academic Symposium ,   2011 12
  • Dependence of Film Thickness on Photocatalytic TiO2 films Depositied by Rf Reactive Sputtering, K. Kanemoto, N. Oka, Y. Shigesato, The 21st MRS-Japan Academic Symposium,   2011 12
  • Electrical Properties and Structure of Amorphous Zn-Sn-O Films, T. Matoba, N. Oka, Y. Shigesato, The 21st MRS-Japan Academic Symposium,   2011 12
  • The Early Stages of ZnO, Al-doped ZnO, Ga-doped ZnO Films Deposited by dc magnetron sputtering, A. Uchida, N. Oka, Y. Shigesato, The 21st MRS-Japan Academic Symposium,   2011 12
  • Study on Shifted Fermi Level of indium-free Transparent Conductive Oxide, J. Jia, A. Takasaki, N. Oka, Y. Shigesato, BIT’s 1st Annual World Congress of Nano-S&T,   2011 10
  • Formation of nano-crystallites in amorphous Zn-Sn-O films as transparent oxide semiconductors, T. Matoba, N. Oka, S. Nakamura, A. Hasegawa, T. Hattori, M. Ishida, Y. Shigesato, BIT’s 1st Annual World Congress of Nano-S&T,   2011 10
  • Thermal properties of nano-size interface between oxide and metallic films -Thermal boundary resistance between Al2O3 and W films, S. Kawasaki, N. Oka, Y. Yamashita, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, BIT’s 1st Annual World Congress of Nano-S&T,   2011 10
  • Effects of high energy particles bombarding on growing film surface during reactive sputtering deposition of TiNx films, M. Ozawa, N. Tsukamoto, N. Oka, Y. Shigesato, BIT’s 1st Annual World Congress of Nano-S&T,   2011 10
  • Heat diffusion mechanisms in transparent conductive oxide films, N. Oka, Y. Shigesato, E-MRS (European Material Research Society) 2011 fall meeting ,   2011 09 , 招待有り
  • Electrical Properties of New In-free Transparent Conductive Oxide Films; Nb-doped TiO2, C. Tasaki, N. Oka, T. Kamiyama, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Thermal Diffusivities of Amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) Films, T. Yoshikawa, N. Oka, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Sb-or Ta-doped SnO2 (ATO or TTO) Films Deposited by Reactive Magnetron Sputtering, S. Nakatomi, Nobuto Oka, Y. Iwabuchi, H. Kotsubo, N. Oka, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Zn-Sn-O Films as Transparent Oxide Semiconductors Deposited by Sputtering, T. Matoba, N. Oka, S. Nakamura, A. Hasegawa, T. Hattori, M. Ishida, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Study on Work Function of Al-doped ZnO Films Surface, N. Oka, A. Takasaki, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Thermophysical Properties of Pure and Nb-doped TiO2 Films, C. Tasaki, N. Oka, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Reactive Gas Flow-Sputter deposition of amorphous WO3 Films for electrochromic devices, N. Oka, M. Watanabe, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, E-MRS 2011 Fall Meeting,   2011 09
  • Transparent conductive Nb-doped TiO2 films deposited by reactive dc magnetron sputtering with impedance control systems, Y. Sanno, N. Tsukamoto, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Thermophysical properties of Alq3 and α-NPD films, K. Kato, T. Yagi, N. Taketoshi, T. Baba, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Thermophysical properties of amorphous IGZO films deposited by dc magnetron sputtering, T. Yoshikawa, N. Oka, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Characterization of a-IGZO Films by Raman Spectroscopy, K. Inoue, K. Matsuda, M. Yoshikawa, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Electrochromic Properties of Mg-doped NiOx Thin Films Sputtered with H2O Introduction, S.V. Green, M. Watanabe, N. Oka, G.G. Granqvist, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Thermal boundary resistance between aluminum oxide and tungsten films, S. Kawasaki, N. Oka, Y. Yamashita, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Thermal diffusivity measurement of TiO2 and Nb-doped TiO2 thin films, C. Tasaki, N. Oka, T. Yagi, N. Taketoshi, T. Baba, T. Kamiyama, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • In-situ analyses on the reactive sputtering process to deposit TiNx films, M. Ozawa, S. Sensui, N. Tsukamoto, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • High Rate Deposition of Electrochromic WO3 Films by Hollow Cathode Gas Flow Sputtering, M. Watanabe, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • In-situ analyses on the reactive sputtering processes to deposit AZO films using an Al-Zn alloy target, N. Tsukamoto, S. Sensui, M. Ozawa, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Photocatalytic TiO2 film depositied by rf reactive aputtering, K. Kanemoto, A. Murata, N. Tsukamoto, N. Oka, M. Fukuchi, T. Fukushima, H. Kaji, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • ependence of Total gas pressure on Thermal and Mechanical properties and Internal Structures in Indium Zinc Oxide Thin Films, M. Takeda, R. Endo, Y. Tkai, M. Oishi, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Photocatalytic activity of WO3 films crystallized by post-annealing in air, J. Takashima, A. murata, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Study on the initial film growth of ZnO transparent conductive films, A. Uchida, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Carrier density dependence of work function for Al-doped ZnO(AZO) films, A. Takasaki, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • In-situ analyses on sputtered fragments in the reactive sputtering process to deposit amorphous IZO films using IZ target, S. Sensui, M. Ozawa, N.Tsukamoto, N. Oka, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Visible-light Active Photocatalytic WO3 Films Deposited by Reactive Gas-Flow Sputtering, A. Murata, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Zn-Sn-O films as transparent amorphous oxide semiconductors, T. Matoba, N. Oka, S. Nakamura, a. Hasegawa, T. Hattori, M. Ishida, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • High Rate Deposition of Ta-doped SnO2(TTO) by Reactive Sputtering with Plasma Emission Intesity or Impedance Feedback systems, Y. Muto, S. Nakatomi, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7),   2011 03
  • Thermal diffusivity of ITO, IZO, AZO, TTO and NTO films analyzed by thermoreflectance method, Y. Shigesato, N. Oka, T. Yagi, N. Taketoshi, T. Baba, TCM 2010 - 3rd International Symposium on Transparent Conductive Materials (former TCO),   2010 10 , 招待有り
  • In-situ analysis of positive and negative energetic ions generated during Sn-doped In2O3 deposition by reactive sputtering, N. Tsukamoto, T. Tazawa, N. Oka, M. Saito, Y. Shigesato, TCM 2010 3rd International Symposium on Transparent Conductive Materials (former TCO),   2010 10
  • High rate deposition of Sb-doped SnO2 films by reactive sputtering using impedance control method, Y. Muto, Y. Nishi, N. Tsukamoto, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, TCM 2010 3rd International Symposium on Transparent Conductive Materials (former TCO),   2010 10
  • Visible-light Active photocatalytic WO3 films loaded with Pt nanoparticles deposited by sputtering, A. Murata, N. Oka, Y. Shigesato, 5th International Conference on Surfaces, Coatings and Nanostructured Materials (NANOSMAT-5),   2010 10
  • High Rate Deposition of Various TCO Films by Reactive Sputtering , N. Oka, Y. Shigesato, Workshop on Transparent Conductive Oxide Thin Films for Electronics and Optics in Green Energy,   2010 08 , 招待有り
  • Thermophysical properties of transparent conductive oxide films with a sub-micron thickness, N. Oka, Workshop on Transparent Conductive Oxide Thin Films for Electronics and Optics in Green Energy,   2010 08 , 招待有り
  • Transparent Conductive Oxide Films by Reactive Sputtering Using Alloy Targets, Nobuto Oka, FEP-seminar (Fraunhofer-Institut f?r Elektronenstrahl- und Plasmatechnik (FEP), Germany),   2010 06 11 , 招待有り
  • High Rate Deposition of High Quality Transparent Conductive Oxide Films by Reactive Magnetron Sputtering Using Alloy Targets, N. Oka, Y. Shigesato, 8th International Conference on Glass and Plastics (ICCG8),   2010 06 , 招待有り
  • Thermophysical properties of various TCO films; ITO, IZO, AZO and TTO films, Y. Shigesato, N. Oka, T. Yagi, N. Taketoshi, T. Baba , CIMTEC 2010, 5th Forum on New Materials ,   2010 06 , 招待有り
  • Electrical and Optical Properties of Nb-doped TiO2 Films Deposited by dc Magnetron Sputtering using a Slightly Reduced Nb-doped TiO2-x Ceramic Targets, Y. Sato, Y. Sanno, C. Tasaki, N. Oka, T. Kamiyama, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Study on Spatial Distribution of Electrical Properties for Al-doped ZnO Films Deposited by DC Magnetron Sputtering using Various Inert Gases, Y. Sato, K. Ishihara, N. Oka, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • In-situ Analyses on Negative Ions in the Sputtering Process to Deposit Al doped ZnO Films, N. Tsukamoto, D. Watanabe, N. Ito, N. Oka, Y. Sato, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Ultra High Rate Depositions of Various Transparent Conductive Oxide Films of AZO, ITO and ATO by Reactive Magnetron Sputtering, Y. Nishi, K. Hirohata, Y. Muto, Y. Kawase, N. Tsukamoto, N. Oka, Y. Sato, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Reactive Magnetron Sputter Deposition of Al-doped ZnO Films with Unipolar Pulsing and Impedance Control System, Y. Nishi, K. Hirohata, N. Tsukamoto, Y. Sato, N. Oka, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Enhancement of Visible-Light Activities of Photocatalytic WO3 Films Deposited by Sputtering, A. Murata, M. Kikuchi, N. Oka, Y. Sato, S. Nakamura, H. Yamaguchi, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Photoelectron Emission Properties and Work Function of Sn-doped In2O3 Films, A. Takasaki, Y. Sato, N. Oka, F. Utsuno, K. Yano, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • High Rate Deposition of SnO2-based Transparent Conductive Films by Reactive Sputtering with Impedance Control Method, Y. Muto, Y. Nishi, K. Hirohata, N. Tsukamoto, N. Oka, Y. Sato, Y. Iwabuchi, H. Kotsubo, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Study on MoO3-x Films Deposited by Reactive Sputtering for Organic Light-Emitting Diodes, N. Oka, H. Watanabe, Y. Sato, N. Ito, H. Tsuji, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Thermophysical Properties of Alq3 and α-NPD Films Measured by Nanosecond Thermoreflectance Technique, N. Oka, K. Kato, N. Ito, T. Yagi, N. Taketoshi, T. Baba, Y. Sato, Y. Shigesato, AVS 56th International Symposium & Exhibition,   2009 11
  • Oxidation barrier performance of SiO2 and Al2O3 films deposited by reactive magnetron sputtering, A. Miida, Y. Sato, N. Oka, F. Utsuno, K. Yano, K. Hasegawa, H. Yamaguchi, S. Nakamura, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Microstructural and electrochromic properties of amorphous WO3 films deposited by dc magnetron sputtering, M. Watanabe, A. Goto, Y. Sato, N. Oka, I. Yamamoto, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Transparent conductive Nb-doped TiO2 films deposited by dc magnetron sputtering using a slightly reduced Nb-doped TiO2 ceramic target, Y. Sanno, Y. Sato, N. Oka, T. Kamiyama, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Electrical and thermophysical properties of Ta doped SnO2 thin films deposited by rf magnetron sputtering, S. Yamada, K. Kimura, T. Okabe, T. Yagi, N. Taketoshi, T. Baba, N. Oka, Y. Sato, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • High rate deposition of Al-doped ZnO (AZO) by reactive sputtering with unipolar pulsing and impedance control system, Y. Nishi, K. Hirohata, N. Tsukamoto, Y. Sato, N. Oka, I. Yamamoto, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Molybdenum oxide films deposited by reactive sputtering for organic light emitting diode devices, H. Watanabe, N. Oka, Y. Sato, N. Ito, H. Tsuji, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Thermal transport properties of Alq3 and α-NPD films, K. Kato, N. Ito, T. Yagi, N. Taketoshi, T. Baba, N. Oka, Y. Sato, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Relationships between carrier density and photoelectron emission properties for ITO thin films, A. Takasaki, Y. Sato, N. Oka, F. Utsuno, K. Yano, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • High Rate Deposition of Sb-doped SnO2 (ATO) by Reactive Sputtering with Impedance Control Method, Y. Muto, Y. Nishi, K. Hirohata, N. Tsukamoto, N. Oka, Y. Sato, Y. Iwabuchi, H. Kostubo, M. Yoshikawa, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Thermal diffusivity measurement of Al-doped ZnO using a nanosecond thermoreflectance technique, K. Kimura, T. Yagi, N. Taketoshi, T. Baba, N. Oka, Y. Sato, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar pulsing and plasma emission control systems, K. Hirohata, Y. Nishi, N. Tsukamoto, N. Oka, Y. Sato, I. Yamamoto, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Visible-Light active photocatalytic WO3 films loaded with Pt nanoparticles, A. Murata, H. Watanabe, N. Oka, Y. Sato, H. Yamaguchi, S. Nakamura, Y. Shigesato, trimurti19766th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • In-Situ Analyses on High Energy Negative Ions in the Sputtering Processes to deposit a-IZO films, S. Sensui, D. Watanabe, N. Oka, Y. Sato, N. Ito, N. Ide, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Characterization of amorphous indium-gallium-zinc-oxide (a-IGZO) films deposited by dc magnetron sputtering with H2O introduction, T. Aoi, N. Oka, Y. Sato, R. Hayashi, H. Kumomi, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Boundary thermal resistance between aluminum oxide and molybdenum films, N. Oka, R. Arisawa, T. Yagi, N. Taketoshi, T. Baba, Y. Sato, Y. Shigesato, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics,   2009 04
  • Thermophysical and Electrical Properties of Polycrystalline ITO and Amorphous In2O3-ZnO Films, T. Ashida, N. Oka, Y. Sato, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (3); Hollow Cathode Gas Flow Sputtering, H. Takeda, Y. Iwabuchi, M. Yoshikawa, N. Oka, Y. Sato, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (2); Unipolar Pulsing with Impedance Control, Y. Nishi, K. Hirohata, N. Oka, Y. Sato, I. Yamamoto, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (1); Unipolar Pulsing with Plasma Emission Control, K. Hirohata, Y. Nishi, N. Oka, Y. Sato, I. Yamamoto, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • Properties of IGZO Films Deposited by Dc Magnetron Sputtering with H2O Introduction, T. Aoi, D. Watanabe, N. Oka, Y. Sato, R. Hayashi, H. Kumomi, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • Characterization of MoO3-x Films Deposited by Reactive Sputtering, H. Watanabe, N. Oka, Y. Sato, N. Ito, H. Tsuji, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • In-situ Analyses on Magnetron Sputtering Processes to Deposit ITO and IZO Films, N. Ito, N. Oka, Y. Sato, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • Influence of High Energy Negative Ion Bombardments on Structure and Electrical Properties of Al Doped ZnO (AZO) Films Deposited by dc Magnetron Sputtering, D. Watanabe, N. Ito, N. Oka, Y. Sato, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • Nb Doped TiO2 Films with Low Resistivity Deposited by dc Magnetron Sputtering using a TiO2-x Target for Transparent Conductive Electrodes, Y. Sato, Y. Sanno, N. Oka, T. Kamiyama, Y. Shigesato, 2008 MRS Fall Meeting,   2008 12
  • Material Ontology: an Infrastructure for exchanging material information and knowledge, T. Ashino, N. Oka, 21st International CODATA Conference ,   2008 10
  • Analysis of Thermophysical Properties for Insulator Oxide Films Using a Thermoreflectance Method, R. Arisawa, T. Yagi, N. Taketoshi, T. Baba, N. Oka, Y. Sato, Y. Shigesato, 1st International Symposium on Thermal Design and Thermophysical Property for Electronics,   2008 06
  • Information Platform for Data Exchange between Heterogeneous Material Data Resources, T. Ashino, N. Oka, Ensuring the Long-Term Preservation and Value Adding to Scientific and Technical Data 2007,   2007 10
  • Development of Information Platform for Data Exchange between Heterogeneous Material Data Resources, T. Ashino, N. Oka, Materials Science and Technology 2007 ,   2007 09
  • Material Database Syndication with RSS, T. Ashino, N. Oka, 20th CODATA International Conference,   2006 10
  • Informatics for ab-initio Computational data in Materials Science, N. Oka, K. Rajan, 20th CODATA International Conference,   2006 10
  • Cyber connection for cross-border collaboration, N. Oka, S. Iwata, 20th CODATA International Conference,   2006 10
  • CoSMIC-IMI Data Infrastructure, M. Heying, N. Oka, W. Hoshida, S. Iwata, S. Broderick, C. Suh, S. Outrey, C. S. Kong, M. Stukowski, K. Rajan, CoSMIC-IMI NSF (National Science Foundation) Site Visit,   2006 05
  • Virtual on-line lecture about the access to LPF database, N. Oka, Y. Chen, S. Iwata, CoSMIC-IMI NSF (National Science Foundation) Site Visit ,   2006 05
  • Crossing the International Digital Divide, N. Oka, K. Boysen, S. Iwata, K. Rajan, CoSMIC-IMI NSF (National Science Foundation) Site Visit ,   2006 05
  • Next Generation Lean GIS for In-situ Decision Making 新一代的在决策支援易地理信息系???, K. Kondoh, N. Oka, Y. Kaneta, Y. Chen, S. Iwata, UT forum 2005,   2005 09
  • An Approach for Data - Driven Decision Making, M. Yabe, N. Oka, Y. Nakai, S. Iwata, 19th International CODATA Conference ,   2004 11
  • Fusion of Data Capture, Self-Organization and Landscape Creation, N. Oka, M. Yabe, A. Sugawara, S. Iwata, 19th International CODATA Conference,   2004 11
  • Converging Technologies for Realizing Environmental Conscious Landscape, N. Oka, H. Sugiura, Y. Yamagiwa, S. Iwata, Landscape Frontier International Symposium 2002,   2002 10
  • Topological Relations of Landscape Experts in WWW, A. Moteki, Y. Terashima, H. Sugiura, N. Oka, S. Iwata, Landscape Frontier International Symposium 2002

Misc

  • Direct mass production technique of graphene by supuercritical fluid [in Japanese], Nobuto Oka, Takaaki Tomai, Itaru Honma, TANSO, 261, 19, 24,   2014 01 , 招待有り
  • Topics of meeting on glass: Report on the 8th International Conference on Coatings on Glass and Plastics, Nobuto Oka, New Glass, 25, 3, 51, 53,   2010 09 , 招待有り
  • Topics of meeting on glass: Report on the 2nd International Symposium on Advanced Technology of Coatings on Glass and Plastic Materials (2nd Mini-ICCG), Nobuto Oka, New glass, 24, 4, 75, 77,   2009 12 , 招待有り

Awards & Honors

  •   2018 12 , The 28th Annual Meeting of MRS-J, Award for Encouragement of Research, Electrical properties of conductive vanadate glass and its application to the air-electrode catalyst for rechargeable metal-air battery
  •   2018 05 , 4th Mediterranean Conference on the Applications of the MössbauerEffect (MECAME2018), Young Scientist Best Paper Award, Local Structural Analysis of Conductive Vanadate Glass Containing Tin or Indium by Means of Mössbauer Spectroscopy
  •   2017 08 , The 15th International Conference on Advanced Materials (IUMRS-ICAM2017), Award for encouragement of research, Vanadate Glass applied to Bifunctional Oxygen Electrode for Metal-Air rechargeable Battery
  •   2017 07 , The 10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-10), Best Poster Award (silver), Vanadate Glass applied to Oxygen Electrode in Metal-Air Rechargeable Battery
  •   2016 01 , 5th International Solvothermal And Hydrothermal Association Conference 2016, Best Poster Award, Analyses of new chalcogenization process using supercritical ethanol for low-cost fabrication of metal-chalcogenide materials
  •   2015 09 , 化学工学会, 第47回秋季大会 超臨界流体部会 学生賞, 超臨界エタノールと固体カルコゲン原料を用いたアモルファス酸化物薄膜から のCZTS薄膜への変換反応
  •   2015 04 , Materials Research Society (MRS), The 1st annual JMR Paper of the Year Award, Thermophysical properties of SnO2-based transparent conductive films: Effect of dopant species and structure compared with In2O3-, ZnO-, and TiO2-based films
  •   2015 03 , 化学工学会反応工学部会CVD反応分科会, 平成26年度 学生奨励賞, 超臨界流体反応を用いて作製した太陽電池用Cu2ZnSn(S,Se)4薄膜の構造特性評価(化学工学会 第46回秋季大会:平成26年9月発表)
  •   2012 10 , Japan Society of Thermophysical Properties, Young Researcher Award of the JSTP, Thermal transport properties of various transparent conductive oxide films
  •   2012 06 , ICCG9 - 9th International Conference on Coatings on Glass and Plastics, Best Poster Award (3rd Prize), High performance electrochromic WO3 films deposited by hollow cathode gas flow sputtering
  •   2011 03 , 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics ( TOEO7 ), Poster Award (Silver), Thermophysical properties of amorphous IGZO films deposited by dc magnetron sputtering
  •   2011 03 , 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO7), Poster Award (Silver), High Rate Deposition of Ta-doped SnO2 (TTO) by Reactive Sputtering with Plasma Emission Intensity or Impedance Feedback systems
  •   2009 04 , 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics ( TOEO6 ), Poster Award, Visible-Light active photocatalytic WO3 films loaded with Pt nanoparticles
  •   2009 04 , 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO6), Poster Award, Transparent conductive Nb-doped TiO2 films deposited by dc magnetron sputtering using a slightly reduced Nb-doped TiO2 ceramic target
  •   2008 12 , 2008 Materials Research Society (MRS) Fall Meeting, U.S.A., Poster Award, Properties of IGZO Films Deposited by Dc Magnetron Sputtering with H2O Introduction